Patent pending surface treatment captures and retains particulate contamination.

Designed for the highest level of contamination control in critical processing applications. Immediate adsorption of liquids for efficient spill clean-up. Chemically compatible with IPA, acetone and other solvents.

Applications include oxidation, metallization, CVD or photolithography processes, cleaning of medical device products, stencil and other print roll cleaning applications, chamber cleaning and CMP processing. Steam autoclavable for aseptic applications.

Sealed edge for reduced fiber contamination. Laundered and packaged in Berkshire’s ISO Class 4 cleanroom. Captures 42 times more particles than competitive (untreated) wipers and Retains 93% of particles captured. Airborne particle release 80% lower than competitive particle attraction wipers